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American Focus > Blog > The White House > Regulatory Relief for Certain Stationary Sources to Promote American Chemical Manufacturing Security – The White House
The White House

Regulatory Relief for Certain Stationary Sources to Promote American Chemical Manufacturing Security – The White House

Last updated: July 17, 2025 8:50 pm
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Regulatory Relief for Certain Stationary Sources to Promote American Chemical Manufacturing Security – The White House
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By the President of the United States of America

A Proclamation

1. The backbone of America’s economy relies heavily on a resilient chemical manufacturing sector that fuels industries ranging from energy to national defense, agriculture, and health care. These facilities are not merely factories; they are the lifeblood of critical infrastructure, providing essential materials for advanced manufacturing, medical sterilization, semiconductors, and defense systems. A strong domestic chemical industry is crucial for ensuring secure supply chains, which in turn minimizes our reliance on foreign sources for materials vital to our national resilience. As global adversaries extend their grip over these key resources, sustaining domestic production is not just an economic necessity; it is a matter of military readiness, public health, and overall national preparedness.

2. On May 16, 2024, the Environmental Protection Agency (EPA) unveiled a significant regulatory measure known as the New Source Performance Standards for the Synthetic Organic Chemical Manufacturing Industry and National Emission Standards for Hazardous Air Pollutants for the Synthetic Organic Chemical Manufacturing Industry and Group I & II Polymers and Resins Industry, 89 FR 42932 (commonly referred to as the HON Rule). This regulation imposes a new set of emissions-control requirements on certain chemical manufacturing facilities, some of which derive their authority from section 112 of the Clean Air Act, 42 U.S.C. 7412.

3. The HON Rule places considerable burdens on chemical manufacturers that are already operating under stringent regulations. A number of the testing and monitoring mandates outlined in this rule depend on technologies that either do not exist in a commercially viable form or have not been proven at a necessary scale. For many facilities, the compliance timeline stipulated in the HON Rule could necessitate costly shutdowns or massive capital investments, all without a clear pathway to compliance. The rule assumes a uniform technological landscape across different facilities, disregarding the significant variations in site conditions, existing permits, and equipment configurations. Disrupting this capacity could weaken vital supply chains, heighten our reliance on foreign producers, and hinder our ability to respond effectively during crises. Such ripple effects would be felt across sectors crucial to America’s industrial fortitude and emergency preparedness.

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NOW, THEREFORE, I, DONALD J. TRUMP, President of the United States of America, under the authority granted to me by the Constitution and the laws of the United States, including section 112(i)(4) of the Clean Air Act, 42 U.S.C. 7412(i)(4), hereby proclaim that certain stationary sources subject to the HON Rule, as identified in Annex I of this proclamation, are exempt from compliance with those provisions of the HON Rule promulgated under section 112 of the Clean Air Act, 42 U.S.C. 7412, for an additional two years beyond the relevant compliance deadlines established by the HON Rule (the Exemption). This Exemption applies to all compliance deadlines set forth in the HON Rule for the stationary sources listed in Annex I, extending each deadline by two years from its original due date. As a result, during this two-year period, these stationary sources will adhere to the emissions and compliance obligations they are currently bound to under the applicable standards that existed prior to the HON Rule. To support this Exemption, I hereby make the following determinations:

a. The technology necessary to implement the HON Rule is not currently available. Such technology does not exist in a commercially viable form sufficient for compliance by the deadlines set forth in the HON Rule.

b. It is in the national security interests of the United States to issue this Exemption for the reasons articulated in paragraphs 1 and 3 of this proclamation.

IN WITNESS WHEREOF, I have hereunto set my hand this seventeenth day of July, in the year of our Lord two thousand twenty-five, and of the Independence of the United States of America the two hundred and fiftieth.

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DONALD J. TRUMP  

ANNEX I

1. Shell Chemical LP
i. Affected Facility/Source: Geismar Plant, Louisiana

2. SABIC Innovative Plastics Mt. Vernon, LLC
i. Affected Facility/Source: Manufacturing Plant, Indiana

3. Bakelite Synthetics
i. Affected Facility/Source:
a. Riegelwood, North Carolina;
b. Conway, North Carolina;
c. Crossett, Arkansas;
d. Louisville, Kentucky;
e. Lufkin, Texas;
f. Taylorsville, Mississippi

4. The Dow Chemical Company
i. Affected Facility/Source: Glycol II Plant, Louisiana

5. Trinseo LLC
i. Affected Facility/Source:
a. Trinseo Facility, Georgia
b. Trinseo Facility, Michigan

6. Formosa Plastics Corporation, U.S.A.
i. Affected Facility/Source:
a. Formosa Plastics Corporation, Louisiana
b. Formosa Plastics Corporation, Texas

7. Union Carbide Corporation/The Dow Chemical Company
i. Affected Facility/Source:
a. Seadrift Operations, Texas
b. Hahnville, St. Charles Parish Facility, Louisiana

8. Westlake Vinyl’s LLC/Westlake Corporation
i. Affected Facility/Source:
a. Petrochemical Complex, Louisiana
b. Styrene Monomer Production Facility, Louisiana
c. Styrene Marine Terminal, Louisiana
d. Lake Charles South Facility, Louisiana
e. Lake Charles North Facility, Louisiana

9. BASF TotalEnergies Petrochemicals LLC
i. Affected Facility/Source: Port Arthur Facility, Texas

10. BASF Corporation
i. Affected Facility/Source:
a. Geismar Facility, Louisiana;
b. North Geismar Facility, Louisiana;
c. Freeport Facility, Texas

11. Rubicon LLC
i. Affected Facility/Source: Geismar Facility, Louisiana

12. CITGO Petroleum Corporation
i. Affected Facility/Source:
a. Lake Charles Refinery, Louisiana
b. Corpus Christi Refinery, Texas
c. Lemont Refinery, Illinois

13. INEOS Americas LLC
i. Affected Facility/Source: Bayport EO Plant, Texas

14. Celanese Corporation
i. Affected Facility/Source:
a. Narrows Facility, Virginia
b. Clear Lake Facility, Texas
c. Bishop Facility, Texas
d. Bay City Facility, Texas

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15. Huntsman Petrochemical LLC
i. Affected Facility/Source:
a. Huntsman Pensacola, Florida
b. Huntsman Conroe, Texas

16. TotalEnergies Petrochemicals & Refining USA, Inc.
i. Affected Facility/Source:
a. TotalEnergies Petrochemicals & Refining USA, Inc., Alabama
b. Cos-Mar Styrene Monomer Plant, Alabama
c. TotalEnergies Polystyrene Plant, Louisiana
d. Port Arthur Refinery, Texas

17. Indorama Ventures Xylenes and PTA
i. Affected Facility/Source: Decatur Facility, Alabama

18. Denka Performance Elastomer LLC
i. Affected Facility/Source: LaPlace Neoprene Production Facility, Louisiana

19. Sasol Chemicals (USA) LLC
i. Affected Facility/Source: Lake Charles Chemical Complex, Louisiana

20. Philips 66 Company
i. Affected Facility/Source:
a. Sweeny Refinery, Texas
b. WRB Refining LP Calvert Refinery, Illinois
c. WRB Refining LP Borger Refinery, Texas

21. Indorama Ventures Oxides, LLC
i. Affected Facility/Source: Port Neches Facility, Texas

22. Eastman Chemical Company
i. Affected Facility/Source: Longview Facility, Texas

23. DuPont Specialty Products USA, LLC
i. Affected Facility/Source: Pontchartrain Site, Louisiana

24. Stepan Company
i. Affected Facility/Source: Millsdale Facility, Illinois

25. Ascend Performance Materials Operations LLC
i. Affected Facility/Source:
a. Ascend Decatur, Alabama;
b. Ascend Alvin, Texas;
c. Ascend Pensacola, Florida

TAGGED:AmericanchemicalHousemanufacturingPromoteRegulatoryReliefSecuritysourcesStationaryWhite
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